EXPOSURE DEVICE FOR DIFFRACTION GRATING PATTERN

PURPOSE:To obtain a small-sized exposing device which can accurately form the latent image of a diffraction grating pattern on a resist which is applied on a substrate in the case of producing a diffraction grating and which is difficult to receive the effect of mechanical vibration. CONSTITUTION:A...

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Bibliographische Detailangaben
1. Verfasser:	HIGUCHI HIDEYO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a small-sized exposing device which can accurately form the latent image of a diffraction grating pattern on a resist which is applied on a substrate in the case of producing a diffraction grating and which is difficult to receive the effect of mechanical vibration. CONSTITUTION:A total reflection mirror 9 is arranged on one end of a glass substrate 8 which is transparent to a laser light beam 4 through a PZT 10. The laser light beam 4 is made incident from the end face of the glass substrate 8 opposed to the mirror 9, advances in the glass substrate 8 and is reflected by the mirror 9. At such a time, an optical distance between a laser light beam incident end face and the mirror 9 is adjusted by the PZT 10, and a standing wave is generated in the substrate 8, then the latent image of the diffraction grating pattern equivalent to the light intensity distribution of the standing wave is formed on the resist 2.