SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES
PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor...
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creator | HANSU PEETAA BURAUN |
description | PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor 20 for generating data A1-A8 relating to the basic feature of the scanned pattern from the image signals F and storing them in a latch circuit 21, a discrimination logic circuit 22 for generating adjustment data E1-E8 to an operation parameter from the basic data A1-A8 and sending them to an attached adjustment means and the input T of the latch circuit 21 operable before starting a sewing process so as to send the stored basic data A1-A8 to the discrimination logic circuit 22. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH04226695A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH04226695A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH04226695A3</originalsourceid><addsrcrecordid>eNrjZDAJdg339HNXcHEN83R2VQj2V3AMVgjxV_B1DHH2UAhwDAlxDfILVvB3UwgJ91dw9vEP8XAN5mFgTUvMKU7lhdLcDIpurkD1uqkF-fGpxQWJyal5qSXxXgEeBiZGRmZmlqaOxsSoAQCodydW</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES</title><source>esp@cenet</source><creator>HANSU PEETAA BURAUN</creator><creatorcontrib>HANSU PEETAA BURAUN</creatorcontrib><description>PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor 20 for generating data A1-A8 relating to the basic feature of the scanned pattern from the image signals F and storing them in a latch circuit 21, a discrimination logic circuit 22 for generating adjustment data E1-E8 to an operation parameter from the basic data A1-A8 and sending them to an attached adjustment means and the input T of the latch circuit 21 operable before starting a sewing process so as to send the stored basic data A1-A8 to the discrimination logic circuit 22.</description><language>eng</language><subject>EMBROIDERING ; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR ; LAUNDERING ; MARKING, INSPECTING, SEAMING OR SEVERING TEXTILE MATERIALS ; SEWING ; TEXTILES ; TREATMENT OF TEXTILES OR THE LIKE ; TUFTING</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920817&DB=EPODOC&CC=JP&NR=H04226695A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920817&DB=EPODOC&CC=JP&NR=H04226695A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HANSU PEETAA BURAUN</creatorcontrib><title>SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES</title><description>PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor 20 for generating data A1-A8 relating to the basic feature of the scanned pattern from the image signals F and storing them in a latch circuit 21, a discrimination logic circuit 22 for generating adjustment data E1-E8 to an operation parameter from the basic data A1-A8 and sending them to an attached adjustment means and the input T of the latch circuit 21 operable before starting a sewing process so as to send the stored basic data A1-A8 to the discrimination logic circuit 22.</description><subject>EMBROIDERING</subject><subject>FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR</subject><subject>LAUNDERING</subject><subject>MARKING, INSPECTING, SEAMING OR SEVERING TEXTILE MATERIALS</subject><subject>SEWING</subject><subject>TEXTILES</subject><subject>TREATMENT OF TEXTILES OR THE LIKE</subject><subject>TUFTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJdg339HNXcHEN83R2VQj2V3AMVgjxV_B1DHH2UAhwDAlxDfILVvB3UwgJ91dw9vEP8XAN5mFgTUvMKU7lhdLcDIpurkD1uqkF-fGpxQWJyal5qSXxXgEeBiZGRmZmlqaOxsSoAQCodydW</recordid><startdate>19920817</startdate><enddate>19920817</enddate><creator>HANSU PEETAA BURAUN</creator><scope>EVB</scope></search><sort><creationdate>19920817</creationdate><title>SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES</title><author>HANSU PEETAA BURAUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH04226695A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>EMBROIDERING</topic><topic>FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR</topic><topic>LAUNDERING</topic><topic>MARKING, INSPECTING, SEAMING OR SEVERING TEXTILE MATERIALS</topic><topic>SEWING</topic><topic>TEXTILES</topic><topic>TREATMENT OF TEXTILES OR THE LIKE</topic><topic>TUFTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HANSU PEETAA BURAUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HANSU PEETAA BURAUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES</title><date>1992-08-17</date><risdate>1992</risdate><abstract>PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor 20 for generating data A1-A8 relating to the basic feature of the scanned pattern from the image signals F and storing them in a latch circuit 21, a discrimination logic circuit 22 for generating adjustment data E1-E8 to an operation parameter from the basic data A1-A8 and sending them to an attached adjustment means and the input T of the latch circuit 21 operable before starting a sewing process so as to send the stored basic data A1-A8 to the discrimination logic circuit 22.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | EMBROIDERING FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR LAUNDERING MARKING, INSPECTING, SEAMING OR SEVERING TEXTILE MATERIALS SEWING TEXTILES TREATMENT OF TEXTILES OR THE LIKE TUFTING |
title | SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES |
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