SEWING DEVICE SO AS TO MATCH PATTERNS OF TWO CLOTHES

PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor...

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1. Verfasser: HANSU PEETAA BURAUN
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To effectively utilize the holding time of a sewing machine and to process the different kinds of patterns. CONSTITUTION: This device is provided with an image sensor 18 for optically scanning the pattern of a fabric piece 16a and generating corresponding image signals F, an image processor 20 for generating data A1-A8 relating to the basic feature of the scanned pattern from the image signals F and storing them in a latch circuit 21, a discrimination logic circuit 22 for generating adjustment data E1-E8 to an operation parameter from the basic data A1-A8 and sending them to an attached adjustment means and the input T of the latch circuit 21 operable before starting a sewing process so as to send the stored basic data A1-A8 to the discrimination logic circuit 22.