PRODUCTION OF THIN-FILM MAGNETIC HEAD

PURPOSE:To prevent the exposing of coil conductor layers by overetching in the sloped parts of interlayer insulating layers at the time of patterning magnetic films for forming 2nd magnetic poles on the interlayer insulating layer coated with the coil conductor layers to 2nd magnetic pole layers by an ion milling method in the process for producing the thin-film magnetic head to be used for magnetic disk devices. CONSTITUTION:The 1st magnetic pole layer 3, a gap layer 4 and the coil conductor layers 6, 8 held by the interlayer insulating layers 5, 7, 9 are successively laminated and formed on a substrate 1 and thereafter, the surfaces exclusive of the 2nd magnetic pole layer forming regions on the above-mentioned interlayer insulating layer 9 are coated and provided with mask material layers 21. The magnetic films 22 for forming the 2nd magnetic pole layers are deposited on the above-mentioned interlayer insulating layer 9 and the gap layer 4 including the surface of the mask material layers 21. The magnetic film parts exposed via resist patterns on the 2nd magnetic pole layer forming regions of the above-mentioned magnetic films 22 are removed by the ion milling method, by which the 2nd magnetic pole layers 24 are formed. The above- mentioned head is thus constituted.