PLANAR TYPE JOSEPHSON ELEMENT AND MANUFACTURE THEREOF
PURPOSE:To enable an S layer, an I layer, and an S layer to be epitaxially grown and to obtain an element where superconductive electron pairs are made to move in a certain direction by a method wherein a first and a second oxide superconductive thin film are made to constitute a junction through th...
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creator | KONNO YOSHITO YOSHISATO MASANOBU |
description | PURPOSE:To enable an S layer, an I layer, and an S layer to be epitaxially grown and to obtain an element where superconductive electron pairs are made to move in a certain direction by a method wherein a first and a second oxide superconductive thin film are made to constitute a junction through the intermediary of an insulating film on the sloping end face of the first oxide superconductive thin film. CONSTITUTION:A first oxide superconductive thin film 2 is formed on a part of a single-crystal substrate 1, and the end face of the thin film 2 is formed into a slope 3. An insulating film 4 is formed the slope 3, the thin film 2, and the residual part of the substrate 1, and furthermore a second oxide superconductive thin film 5 is formed on the insulating film 4. By this setup, in a junction of composed of a superconductor S, an insulator I, and a superconductor S, all the S layer, the I layer, and the S layer are epitaxially grown orientated in a c-axis vertical to the surface of the substrate 1, and an ab-plane is formed parallel with the surface of the substrate 1, whereby an SIS junction is formed in this direction. |
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CONSTITUTION:A first oxide superconductive thin film 2 is formed on a part of a single-crystal substrate 1, and the end face of the thin film 2 is formed into a slope 3. An insulating film 4 is formed the slope 3, the thin film 2, and the residual part of the substrate 1, and furthermore a second oxide superconductive thin film 5 is formed on the insulating film 4. By this setup, in a junction of composed of a superconductor S, an insulator I, and a superconductor S, all the S layer, the I layer, and the S layer are epitaxially grown orientated in a c-axis vertical to the surface of the substrate 1, and an ab-plane is formed parallel with the surface of the substrate 1, whereby an SIS junction is formed in this direction.</description><language>eng</language><subject>ELECTRICITY</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920707&DB=EPODOC&CC=JP&NR=H04188683A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920707&DB=EPODOC&CC=JP&NR=H04188683A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KONNO YOSHITO</creatorcontrib><creatorcontrib>YOSHISATO MASANOBU</creatorcontrib><title>PLANAR TYPE JOSEPHSON ELEMENT AND MANUFACTURE THEREOF</title><description>PURPOSE:To enable an S layer, an I layer, and an S layer to be epitaxially grown and to obtain an element where superconductive electron pairs are made to move in a certain direction by a method wherein a first and a second oxide superconductive thin film are made to constitute a junction through the intermediary of an insulating film on the sloping end face of the first oxide superconductive thin film. CONSTITUTION:A first oxide superconductive thin film 2 is formed on a part of a single-crystal substrate 1, and the end face of the thin film 2 is formed into a slope 3. An insulating film 4 is formed the slope 3, the thin film 2, and the residual part of the substrate 1, and furthermore a second oxide superconductive thin film 5 is formed on the insulating film 4. 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CONSTITUTION:A first oxide superconductive thin film 2 is formed on a part of a single-crystal substrate 1, and the end face of the thin film 2 is formed into a slope 3. An insulating film 4 is formed the slope 3, the thin film 2, and the residual part of the substrate 1, and furthermore a second oxide superconductive thin film 5 is formed on the insulating film 4. By this setup, in a junction of composed of a superconductor S, an insulator I, and a superconductor S, all the S layer, the I layer, and the S layer are epitaxially grown orientated in a c-axis vertical to the surface of the substrate 1, and an ab-plane is formed parallel with the surface of the substrate 1, whereby an SIS junction is formed in this direction.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ELECTRICITY |
title | PLANAR TYPE JOSEPHSON ELEMENT AND MANUFACTURE THEREOF |
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