RADIOSENSITIVE MIXTURE AND MANUFACTURE OF RELIEF STRUCTURAL BODY

PURPOSE: To form an image of a submicron unit by consisting of a binder insoluble in water and soluble in an alkaline aq. solution, a compound generating a strong acid by the irradiation and an organic compound capable of condensation in the presence of an acid and containing at least one phenolic h...

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1. Verfasser: ZON GUIEN KIMU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To form an image of a submicron unit by consisting of a binder insoluble in water and soluble in an alkaline aq. solution, a compound generating a strong acid by the irradiation and an organic compound capable of condensation in the presence of an acid and containing at least one phenolic hydroxyl group in all composition components. CONSTITUTION: This radiation sensitive mixture consists of a combination of the binder insoluble in water and soluble in the alkaline aq. solution or the binder mixture, the compound generating the acid by the irradiation and the organic compound (c) capable of the condensation in the presence of the acid and the all of the components have at least one of the phenolic hydroxyl group. The radiation sensitive mixture obtained in this way has high sensitivity and excellent structural property and particularly is prominent in remarkably excellent adhesion to the surface of silica and has excellent reproducibility and the image forming structural physical property of a relief produced thereby is extremely excellent in submicron unit.