SPUTTERING DEVICE

PURPOSE:To provide the titled device which can be easily set at a prescribed pressure by regulating the valve between a vacuum chamber and a vacuum pump by a detected pressure value. CONSTITUTION:A prescribed gas is introduced into the vacuum chamber 1 from the valve 6 while the valve 2 is held open...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	NAKABACHI YOSHIKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To provide the titled device which can be easily set at a prescribed pressure by regulating the valve between a vacuum chamber and a vacuum pump by a detected pressure value. CONSTITUTION:A prescribed gas is introduced into the vacuum chamber 1 from the valve 6 while the valve 2 is held open and thereafter, a controller 7 is set at the prescribed pressure. The valve 2 is gradually closed by receiving this pressure signal and the detected pressure value of a pressure gage 5 increases successively with this closing. On the other hand, the detected pressure of the pressure gage 4 of the vacuum pump 3 decreases successively. The detected value of the pressure gage 4 returns to the original pressure and settles constant at the min. detected pressure value if the valve 2 is held closed to some extent and is held intact in this state. The specified pressure is maintained in the vacuum chamber 1 as well at this time. Namely, the control signal is so emitted from the controller 7 that the detected value of the pressure gage 4 attains the pressure when the gas is introduced. The detected value of the pressure gage 5 is so fed back as to attain the set pressure, by which the regulation of the valve 2 is executed.