PRODUCTION OF COLOR FILTER

PURPOSE:To obtain the filter which does not require material management and dyeing liquid management and has good patterning accuracy by solidifying dye materials onto a base material to form color layers and etching these layers with resist patterns as a mask. CONSTITUTION:A flat layer 5 is applied...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MAEDA RYUJI, MORISHIGE AKIRA, ONODERA MASANORI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To obtain the filter which does not require material management and dyeing liquid management and has good patterning accuracy by solidifying dye materials onto a base material to form color layers and etching these layers with resist patterns as a mask. CONSTITUTION:A flat layer 5 is applied on a substrate and the color layer 9 formed by dissolving a dye stuff in an acrylic resin, an intermediate layer 10 and a UV resist film 11 are deposited thereon. The regions on desired picture elements are then coated with a mask 12 and are exposed to pattern the resist film 11, by which the resist patterns 11A are formed. The intermediate layer 10 remains under the resist patterns 11A when the intermediate layer 10 is dry etched with these resist patterns as a mask. The color patterns 9A are formed when the color layer 9 is wet etched with the intermediate layer 10A as a mask. Separating layers 13 are deposited thereon. The color filters are formed by repeating the above-mentioned stages for three colors.