METHOD FOR COATING BASE BODY WITH FILM
PURPOSE:To form a film good in uniformity of film thickness at the high coating velocity on a base body having large area by deforming arc discharge plasma into sheet plasma by a magnetic field means and introducing a gaseous raw material and depositing the component of the gaseous raw material on t...
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| creator | OGINO ETSUO NAKAI HIDEMI MATSUMURA ETSUZO OKADA KEN |
| description | PURPOSE:To form a film good in uniformity of film thickness at the high coating velocity on a base body having large area by deforming arc discharge plasma into sheet plasma by a magnetic field means and introducing a gaseous raw material and depositing the component of the gaseous raw material on the surface of the base material while moving the base body in the prescribed direction. CONSTITUTION:After the inside of a vacuum tank 1 is enhanced, discharge gas such as Ar is introduced thereinto through an introduction pipe 10. Current is supplied and sheet plasma 14 is caused by performing arc discharge between a plasma generation source 4 and an anode 5. At this time, plasma 14 becomes a shape of thin thickness having a projected face in the direction of the base body 3 by an air core coil 6 and a permanent magnet 7. Then a gaseous raw material such as gaseous SiH4 and gaseous O2 is supplied into plasma 14 form a supply nozzle 9. In this state, base body 3 is moved in the direction shown by the arrow wherein both a generation source 4 of plasma 14 and the anode 5 are joined and a film such as SiO2 is formed on the base body 3. |
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CONSTITUTION:After the inside of a vacuum tank 1 is enhanced, discharge gas such as Ar is introduced thereinto through an introduction pipe 10. Current is supplied and sheet plasma 14 is caused by performing arc discharge between a plasma generation source 4 and an anode 5. At this time, plasma 14 becomes a shape of thin thickness having a projected face in the direction of the base body 3 by an air core coil 6 and a permanent magnet 7. Then a gaseous raw material such as gaseous SiH4 and gaseous O2 is supplied into plasma 14 form a supply nozzle 9. In this state, base body 3 is moved in the direction shown by the arrow wherein both a generation source 4 of plasma 14 and the anode 5 are joined and a film such as SiO2 is formed on the base body 3.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1992</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920410&DB=EPODOC&CC=JP&NR=H04110473A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19920410&DB=EPODOC&CC=JP&NR=H04110473A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OGINO ETSUO</creatorcontrib><creatorcontrib>NAKAI HIDEMI</creatorcontrib><creatorcontrib>MATSUMURA ETSUZO</creatorcontrib><creatorcontrib>OKADA KEN</creatorcontrib><title>METHOD FOR COATING BASE BODY WITH FILM</title><description>PURPOSE:To form a film good in uniformity of film thickness at the high coating velocity on a base body having large area by deforming arc discharge plasma into sheet plasma by a magnetic field means and introducing a gaseous raw material and depositing the component of the gaseous raw material on the surface of the base material while moving the base body in the prescribed direction. CONSTITUTION:After the inside of a vacuum tank 1 is enhanced, discharge gas such as Ar is introduced thereinto through an introduction pipe 10. Current is supplied and sheet plasma 14 is caused by performing arc discharge between a plasma generation source 4 and an anode 5. At this time, plasma 14 becomes a shape of thin thickness having a projected face in the direction of the base body 3 by an air core coil 6 and a permanent magnet 7. Then a gaseous raw material such as gaseous SiH4 and gaseous O2 is supplied into plasma 14 form a supply nozzle 9. In this state, base body 3 is moved in the direction shown by the arrow wherein both a generation source 4 of plasma 14 and the anode 5 are joined and a film such as SiO2 is formed on the base body 3.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1992</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDzdQ3x8HdRcPMPUnD2dwzx9HNXcHIMdlVw8neJVAj3DPFQcPP08eVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfFeAR4GJoaGBibmxo7GxKgBAJ7ZI1E</recordid><startdate>19920410</startdate><enddate>19920410</enddate><creator>OGINO ETSUO</creator><creator>NAKAI HIDEMI</creator><creator>MATSUMURA ETSUZO</creator><creator>OKADA KEN</creator><scope>EVB</scope></search><sort><creationdate>19920410</creationdate><title>METHOD FOR COATING BASE BODY WITH FILM</title><author>OGINO ETSUO ; NAKAI HIDEMI ; MATSUMURA ETSUZO ; OKADA KEN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH04110473A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1992</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>OGINO ETSUO</creatorcontrib><creatorcontrib>NAKAI HIDEMI</creatorcontrib><creatorcontrib>MATSUMURA ETSUZO</creatorcontrib><creatorcontrib>OKADA KEN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OGINO ETSUO</au><au>NAKAI HIDEMI</au><au>MATSUMURA ETSUZO</au><au>OKADA KEN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR COATING BASE BODY WITH FILM</title><date>1992-04-10</date><risdate>1992</risdate><abstract>PURPOSE:To form a film good in uniformity of film thickness at the high coating velocity on a base body having large area by deforming arc discharge plasma into sheet plasma by a magnetic field means and introducing a gaseous raw material and depositing the component of the gaseous raw material on the surface of the base material while moving the base body in the prescribed direction. CONSTITUTION:After the inside of a vacuum tank 1 is enhanced, discharge gas such as Ar is introduced thereinto through an introduction pipe 10. Current is supplied and sheet plasma 14 is caused by performing arc discharge between a plasma generation source 4 and an anode 5. At this time, plasma 14 becomes a shape of thin thickness having a projected face in the direction of the base body 3 by an air core coil 6 and a permanent magnet 7. Then a gaseous raw material such as gaseous SiH4 and gaseous O2 is supplied into plasma 14 form a supply nozzle 9. In this state, base body 3 is moved in the direction shown by the arrow wherein both a generation source 4 of plasma 14 and the anode 5 are joined and a film such as SiO2 is formed on the base body 3.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | METHOD FOR COATING BASE BODY WITH FILM |
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