METHOD FOR COATING BASE BODY WITH FILM

PURPOSE:To form a film good in uniformity of film thickness at the high coating velocity on a base body having large area by deforming arc discharge plasma into sheet plasma by a magnetic field means and introducing a gaseous raw material and depositing the component of the gaseous raw material on t...

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Bibliographische Detailangaben
Hauptverfasser: OGINO ETSUO, NAKAI HIDEMI, MATSUMURA ETSUZO, OKADA KEN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To form a film good in uniformity of film thickness at the high coating velocity on a base body having large area by deforming arc discharge plasma into sheet plasma by a magnetic field means and introducing a gaseous raw material and depositing the component of the gaseous raw material on the surface of the base material while moving the base body in the prescribed direction. CONSTITUTION:After the inside of a vacuum tank 1 is enhanced, discharge gas such as Ar is introduced thereinto through an introduction pipe 10. Current is supplied and sheet plasma 14 is caused by performing arc discharge between a plasma generation source 4 and an anode 5. At this time, plasma 14 becomes a shape of thin thickness having a projected face in the direction of the base body 3 by an air core coil 6 and a permanent magnet 7. Then a gaseous raw material such as gaseous SiH4 and gaseous O2 is supplied into plasma 14 form a supply nozzle 9. In this state, base body 3 is moved in the direction shown by the arrow wherein both a generation source 4 of plasma 14 and the anode 5 are joined and a film such as SiO2 is formed on the base body 3.