FILM CAPACITOR
PURPOSE:To make it possible to highly maintain the withstand voltage as a capacitor even when a non-impregnated part of resin and the like is generated by a method wherein among the gaps between the electrodes on one main surface side of a dielectric film, the spacing of those gaps located almost in...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To make it possible to highly maintain the withstand voltage as a capacitor even when a non-impregnated part of resin and the like is generated by a method wherein among the gaps between the electrodes on one main surface side of a dielectric film, the spacing of those gaps located almost in the center part is made wider than the spacing of the other gaps. CONSTITUTION:The space d2, which is the gap 12 between the electrodes 11, 11... formed on one main surface of a dielectric film 10 and located in the center part of a dielectric film 10, is formed wider than the space d1 of other gaps 12 located on the main surface. In this case, in order to opposingly position the electrodes 11 and 21 alternately pinching a dielectric film 20, the width of the electrodes 21 opposing to the gap 12 of the space d2 is made wider than the other gaps. A wound type high tension film capacitor is obtained by superposing the above-mentioned dielectric films 10 and 20 and winding them in longitudinal direction L. As the leak-resisting property of the gap 12 in the center part, where space D2 is made larger, is enhanced, the withstand voltage as a capacitor can be maintained high even when a non-impregnated part is generated in the vicinity of the gap 12 of the center part. |
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