DETECTING METHOD FOR EXPOSED AREA

PURPOSE:To detect the position information on a substrate with high accuracy by varying an optical characteristic of a film-like body in an exposed area, photodetecting a scattered light generated at the time when this area is irradiated with a light beam and discriminating the exposed area. CONSTIT...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	ISHIWATARI NAOYUKI, KIKUCHI TAKEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To detect the position information on a substrate with high accuracy by varying an optical characteristic of a film-like body in an exposed area, photodetecting a scattered light generated at the time when this area is irradiated with a light beam and discriminating the exposed area. CONSTITUTION:By radiating a light beam through a window 6 having an opening 7, a light beam 8 is generated, this light beam 8 is radiated to a photoresist layer 2 formed on a substrate 3, and by moving the substrate 3 in parallel to the window 6, or moving the window 6 in parallel to the substrate 3, the light beam 8 is allowed to scan on the whole area of the photresist layer 2. Subsequently, when an exposed area 4 is irradiated with the light beam 8, a strong scattered light is generated, therefore, this scattered light is detected by using a dark field detecting device 9. In such a way, a position of the exposed area 4 can be detected exactly.