PHOTORESIST COMPOSITE

PURPOSE: To form an image of high resolution and to ensure low brittleness and high thermal and chemical resistances after heat curing by modifying a photosetting compsn. with a binder and a crosslinking agent. CONSTITUTION: This photoresist compsn. is a photopolymerizable and solvent- developable c...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ROBAATO JIEIMUSU RAN, KURISUTOFUA KUROENKE, KURUTO MAIYAA, JIYURIANO OIGUSUTAA
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE: To form an image of high resolution and to ensure low brittleness and high thermal and chemical resistances after heat curing by modifying a photosetting compsn. with a binder and a crosslinking agent. CONSTITUTION: This photoresist compsn. is a photopolymerizable and solvent- developable compsn. consisting of a photopolymerizable (meth)acrylate, a photoinitiator for the (meth)acrylate, an org. polymer binder contg. free carboxyl groups and having an acid value of at least 60, a blocked polyisocyanate having at least 100 deg.C cleavage temp. as a crosslinking agent and an inert solvent enough to pour the compsn. An image of high resolution is formed and low brittleness and high thermal and chemical resistances are ensured after heat curing.