CLEANING EQUIPMENT

PURPOSE:To prevent the charge on brush material and an object to be washed and simplify washing process, by constituting a brush used at the time of scrubbing and cleaning of conductive material, and grounding the brush. CONSTITUTION:As to a brush 20, conductive material, e.g. acrylic rayon and the like containing carbon is used as brush material 21. The brush 20 is connected to a grounded electrode 3 via the conductive material. When foreign matter is eliminated by directly bringing the brush 20 into contact with the surface of a wafer 1, electric charge generated in the process like this is eliminated through the conductive material used as the brush material 21. Thereby electric charge concentration on the brush material 21 and the wafer 1 are not caused, and the electric charge generated at the time of removal of foreign matter and scrubbing in the cleaning process or in the pretreatment process can be eliminated.