DESIGN OF SEMICONDUCTOR DEVICE

PURPOSE:To enable the dielectric breakdown lifetime of a semiconductor device in an electrical field to be evaluated by a method wherein a drain avalanche is made to occur in a micro MOS transistor, and the induced holes are introduced into a gate insulating film. CONSTITUTION:The voltage of a drain...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NISHIOKA TAIJO, OJI YUZURU
Format: Patent
Sprache:eng
Schlagworte:
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