ATOMIZED THIN FILM FORMING DEVICE

PURPOSE:To form a thin film having a uniform film thickness on a substrate over a long period of time by forming a release port for atomized raw materials to a specific shape at the time of spraying the atomized raw materials onto the heated substrate and forming the thin film thereon. CONSTITUTION:...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	SEKIGUCHI MIKIO, SHIBA NOBUYASU, IMAI MIZUHO, IIDA HIDEYO
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL NOZZLES PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To form a thin film having a uniform film thickness on a substrate over a long period of time by forming a release port for atomized raw materials to a specific shape at the time of spraying the atomized raw materials onto the heated substrate and forming the thin film thereon. CONSTITUTION:The substrate 6 consisting of glass, etc., is uniformly heated by a heater 8 via a soaking plate 7 and while the substrate is moved, an aq. soln. contg. the film forming raw materials ejected from a slit-shaped nozzle 3 of an atomizing chamber 1 is sprayed in the form of mists to form the thin film of an oxide, etc., on the surface of the substrate. The inside wall surfaces 3a, 3b at the top end of the nozzle 3 are drawn vertically with a smoothly curved surface, by which the atomized raw materials are risen in the form of smooth laminar flow and are admitted into a film forming chamber 4 without generating vortexes; therefore, the thin film of the uniform thickness is formed on the surface of the substrate 6 over a long period of time.