PRODUCTION OF COLOR FILTER

PURPOSE:To prevent the generation of unequal dyeing by selectively dyeing a dyeing base film while selectively opening the resist film applied on the dyeing base film which is formed by one time of application. CONSTITUTION:A dyeing base material 2 imparted with photosensitivity is applied on a subs...

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Bibliographische Detailangaben
1. Verfasser: MINO YOSHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To prevent the generation of unequal dyeing by selectively dyeing a dyeing base film while selectively opening the resist film applied on the dyeing base film which is formed by one time of application. CONSTITUTION:A dyeing base material 2 imparted with photosensitivity is applied on a substrate 1 and is subjected to full-surface exposing. This material is then selectively exposed by using a photomask 4b having light shielding parts 3 to provide parts 6 and 6b of different degrees of polymn. in the dyeing base film. A positive resist 11 is then formed as a protective mask and the dyeing base film exposed in the apertures of the resist is dyed and chemically treated. The stages for providing the fresh apertures on the resist and subjecting the resist to the dyeing and chemical treatment is repeated to obtain the required color filter. A protective 8 for the filters is finally formed on the surface of the dyeing base film. The unequalness heretofore generated by the drooling of pattern edges is, therefore, eliminated. The unequal dyeing is obviated in this way and the improvement in image quality is made.