PRODUCTION OF THIN-FILM MAGNETIC HEAD

PURPOSE:To prevent a lower magnetic film form being pitted by an etching liquid by forming an etching stopping film on a lower magnetic film. CONSTITUTION:The lower magnetic film 2 consisting of 'Permalloy(R)' is patterned on a substrate and the film of Ti is formed as the etching stopping film 3 at 300Angstrom thereon. An alumina film to serve as a gap film 4 is then formed over the entire surface of the substrate. The patterns by a photoresist 5 are formed by photolithography to mask the surface with the resist 5. Further, the substrate is immersed into the etching liquid consisting of phosphoric acid to etch the alumina which is the gap film 4. The titanium film 3 which is the etching-stopping film is further removed by the etching liquid consisting of a liquid mixture composed of hydrogen peroxide and ammonia water. The photoresist 5 is removed by an org. solvent to form contact holes 6. The direct exposure of the lower magnetic film 2 to the etching liquid is obviated by forming the etching-stopping film 3 on the lower magnetic film 2 in such a manner.