MANUFACTURE OF SEMICONDUCTOR DEVICE

PURPOSE:To improve reliability by selectively eliminating an insulating film, an oxidation resistant film, a silicon film, and metal silicide laminated on a substrate, performing heat treatment in an oxidizing atmosphere, and constituting a gentle shape. CONSTITUTION:A laminated film is formed by la...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	HIGASHIMOTO MASAYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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