METHOD AND DEVICE FOR PLOTTING PRINTED SUBSTRATE MASK

PURPOSE:To prevent the generation of pattern thinning or slits and to improve mask quality and design efficiency based upon easy input operation by synthesizing divided graphics at the time of forming mask plotting data. CONSTITUTION:In the case of forming an area filling pattern 11, the pattern 11 is divided into graphics 12 to 14, which are inputted to an area filling pattern input part 5 by a digitizer 1 or a graphic processing terminal 2. The data of the divided graphics 12 to 14 are supplied to an area filling pattern synthesizing part 6 and synthesized as synthesized graphic data to obtain synthesized graphic data whose vertex consists of an outline plotting locus 16 formed by an aperture 15. Data are formed so that the generation of pattern thinning and slits is suppressed in the synthesized graphic. Then an area filling pattern mask plotting data forming part 7 obtains the area filling pattern data of a printed substrate mask based upon the synthesized graphic data. Consequently, the outline plotting locus 16 is not set up on the contact parts of respective divided graphics and the generation of pattern thinning and slits on the contact parts can be prevented.