PHOTOCONDUCTIVE RECORDING MATERIAL WITH SPECIAL OUTERMOST LAYER

PHOTOCONDUCTIVE RECORDING MATERIAL WITH SPECIAL OUTERMOST LAYER

PURPOSE: To improve sensitivity and wear resistance by incorporating a siloxane copolymer contg. at least one kind of specified polysiloxane block copolymerized with specified arom. carbonate units into the outermost layer. CONSTITUTION: This photoconductive recording material contains one or more k...

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Bibliographische Detailangaben
Hauptverfasser: PEETAA HORURASHIYAA, URURIHI GURIGO, SUTEFUAAN KARERU DO MUTERU, DABITSUDO RISHIYAARU TERERU, FUORUKAA SERINI
Format: Patent
Sprache:eng
Schlagworte:
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTROGRAPHY
ELECTROPHOTOGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MAGNETOGRAPHY
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PHOTOGRAPHY
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:PURPOSE: To improve sensitivity and wear resistance by incorporating a siloxane copolymer contg. at least one kind of specified polysiloxane block copolymerized with specified arom. carbonate units into the outermost layer. CONSTITUTION: This photoconductive recording material contains one or more kinds of siloxane copolymers each contg. at least one kind of polysiloxane block copolymerized with arom. carbonate units in the outermost layer. The polysiloxane block consists of 5-200 diorganosiloxy units to which org. substituents such as alkyl or aralkyl groups have been chemically bonded and the block exists by 0.3-6wt.% of the amt. of the copolymer. The arom. carbonate units are represented by formula I and exist by 94-99.7wt.% of the amt. of the copolymer. In the formula I, X is S, SO2 , etc., and each of R -R is H, halogen, alkyl or aryl. Satisfactory wear resistance and high photosensitivity can be ensured.