PRODUCTION OF SEMICONDUCTOR DEVICE AND MASK USED FOR THE PRODUCTION

PRODUCTION OF SEMICONDUCTOR DEVICE AND MASK USED FOR THE PRODUCTION

PURPOSE:To form a pattern having high resolution and high dimensional accuracy by exposing a photosensitive film so that the intensity of light for exposure is enhanced in accordance with the increase of the thickness of the photosensitive film and developing the exposed film. CONSTITUTION:Al 17 for...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: MORIUCHI NOBORU
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PURPOSE:To form a pattern having high resolution and high dimensional accuracy by exposing a photosensitive film so that the intensity of light for exposure is enhanced in accordance with the increase of the thickness of the photosensitive film and developing the exposed film. CONSTITUTION:Al 17 for wiring forming a second layer is coated with a photoresist 18 and this photoresist 18 is developed after exposure with a mask 50 changing the intensity of transmitted light to make the thickness of the photoresist 18 nearly uniform. Holes 34, 35 are then pierced in the resist 18 by exposure with an ordinary photomask 18 and development. The Al 17 forming the second layer as an underlayer is etched with the remaining resist 18 as a mask to form a desired pattern. High resolution and high dimensional accuracy are ensured for the pattern.