PRODUCTION OF SUPERCONDUCTIVE COMPOUND OXIDE FILM

PURPOSE:To obtain the subject superconductive film having a high superconduction property without a treatment such as postannealing by blowing O3 gas onto the film-forming surface of a substrate and then carrying out film forming of a compound oxide superconductive material layer using the spatterin...

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Bibliographische Detailangaben
Hauptverfasser: HARADA KEIZO, NAKANISHI SHUSUKE, ITOZAKI HIDEO, HIGAKI KENJIRO, YATSU SHUJI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain the subject superconductive film having a high superconduction property without a treatment such as postannealing by blowing O3 gas onto the film-forming surface of a substrate and then carrying out film forming of a compound oxide superconductive material layer using the spattering method. CONSTITUTION:A film forming chamber 1 is once evacuated and Ar gas is then introduced thereinto. A high-frequency electric power is applied to a target 5 and a thin film having a composition corresponding to that of the target 5 is formed on the surface of a substrate 2. During the film formation, O3 gas is blown thereonto through a ring-shaped nozzle 7 to obtain the objective superconductive compound oxide thin film. By this method, the above mentioned superconductive thin film having a high superconduction property is obtained without post-annealing after film forming. In addition, SrTiO3 single crystal, MgO single crystal, etc., are exemplified as the material for the substrate 2 and La-, Y-. Bi-based high-temperature superconductive oxide, etc., are exemplified as the superconductive compound oxide material. By the above mentioned method, the objective superconductive compound oxide thin film of high quality can be formed with fewer processes.