RESIST COATING DEVICE

PURPOSE:To eliminate the irregularity of sensitivity by maintaining a constant cooling temperature by a method wherein a cooling part is provided directly behind a baking oven where a baking treatment is conducted after coating of a resist. CONSTITUTION:A photomask is fed to a spin part 2 from a cas...

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Bibliographische Detailangaben
1. Verfasser:	OGURA TAKEISA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To eliminate the irregularity of sensitivity by maintaining a constant cooling temperature by a method wherein a cooling part is provided directly behind a baking oven where a baking treatment is conducted after coating of a resist. CONSTITUTION:A photomask is fed to a spin part 2 from a cassette, and a resist is coated thereon. Then, the photomask is conveyed to a baking oven 3, and a prebaking treatment is conducted. After the baking has been finished, the photomask is brought into a cooling part 12 passing through a code 11, and after the photomask has been cooled, it is housed in the cassette 4 of an unloading part.