SILICON WAFER

PURPOSE:To reduce the fluctuation in yield by a method wherein the specific requirements are met for the oxygen concentration between lattices before and after the first heat treatment of silicon wafers as well as before and after the second and third heat treatments. CONSTITUTION:When the oxygen co...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAGINO MASANOBU, AMAI TSUTOMU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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