ION BEAM SCANNING CONTROLLER OF ION IMPLANTING DEVICE

PURPOSE:To generate such an impression voltage to each electrode as to meet the parallel scan conditions by generating two reference voltages, and controlling the impression voltage on the basis of a function depending upon these voltages. CONSTITUTION:Arrangement according to the present invention...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SAKURADA YUZO, TSUKAGOSHI OSAMU, KASHIMOTO KAZUHIRO, TAKEGAWA SHINYA, NIIKURA KOICHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To generate such an impression voltage to each electrode as to meet the parallel scan conditions by generating two reference voltages, and controlling the impression voltage on the basis of a function depending upon these voltages. CONSTITUTION:Arrangement according to the present invention includes an up/down counter 2, which counts reference clock pulses until a scheduled number is attained in conformity to a motion control signal set previously by No.1 memory device and emits a scheduled digital value, and a No.1 D/A converter 4 which generates No.1 reference voltage from the output of said counter 2. This is further equipped with No.2 memory device 9 which emits a separately scheduled digital value in synchronization with another reference clock signal obtained when the value on the counter 2 has attained the schedule value, No.2 D/A converter 10 which generates No.2 reference voltage from the output of this memory device 9, and a calculating circuit 11 which puts the No.1, No.2 reference voltages generated from these No.1, No.2 D/A converters 4, 10 into computational processing and forms voltages to be impressed on the electrodes of two multi-polar electrostatic deflectors. This accomplishes generation and impression of such a voltage to the electrodes of each deflector as to meet the parallel scan conditions.