PRODUCTION OF ELECTRICALLY CONDUCTIVE TRANSPARENT FILM
PURPOSE:To produce an electrically conductive transparent film having superior bending resistance and hardly causing cracking by specifying the amt. of water released from a transparent org. polymer film as a substrate when a transparent thin film of In oxide, etc., is continuously formed on the pol...
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| creator | YAMASHITA MICHIHIRO WATANABE YASUMITSU KITANO MASAKAZU |
| description | PURPOSE:To produce an electrically conductive transparent film having superior bending resistance and hardly causing cracking by specifying the amt. of water released from a transparent org. polymer film as a substrate when a transparent thin film of In oxide, etc., is continuously formed on the polymer film. CONSTITUTION:When a transparent thin film of at least one of In and Sn oxides is continuously formed on a transparent org. polymer film such as a polyethylene terephthalate film as a substrate, the water content of the polymer film is previously reduced so that the amt. of water released from the film during the formation of the thin oxide film is regulated to |
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CONSTITUTION:When a transparent thin film of at least one of In and Sn oxides is continuously formed on a transparent org. polymer film such as a polyethylene terephthalate film as a substrate, the water content of the polymer film is previously reduced so that the amt. of water released from the film during the formation of the thin oxide film is regulated to <=3cc/m .min. In order to reduce the water content, the film may be rewound under heating in a vacuum vessel. 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CONSTITUTION:When a transparent thin film of at least one of In and Sn oxides is continuously formed on a transparent org. polymer film such as a polyethylene terephthalate film as a substrate, the water content of the polymer film is previously reduced so that the amt. of water released from the film during the formation of the thin oxide film is regulated to <=3cc/m .min. In order to reduce the water content, the film may be rewound under heating in a vacuum vessel. 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CONSTITUTION:When a transparent thin film of at least one of In and Sn oxides is continuously formed on a transparent org. polymer film such as a polyethylene terephthalate film as a substrate, the water content of the polymer film is previously reduced so that the amt. of water released from the film during the formation of the thin oxide film is regulated to <=3cc/m .min. In order to reduce the water content, the film may be rewound under heating in a vacuum vessel. An electrically conductive transparent thin film having superior bending resistance and high quality and hardly causing cracking is formed on the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PRODUCTION OF ELECTRICALLY CONDUCTIVE TRANSPARENT FILM |
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