RESIST COMPOSITION

PURPOSE:To obtain a resist compsn. having well-balanced resist characteristics and being suitable to be used for lithography using short wavelength light such as far ultraviolet rays, KrF rays, excimer laser light, by incorporating a hydrogenated product of a specified alkali-soluble phenol resin an...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YAMADA TAKAMASA, OIE MASAYUKI, KAMIYA SHIGEMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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