RESIST COMPOSITION

PURPOSE:To obtain a resist compsn. having well-balanced resist characteristics and being suitable to be used for lithography using short wavelength light such as far ultraviolet rays, KrF rays, excimer laser light, by incorporating a hydrogenated product of a specified alkali-soluble phenol resin an...

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Bibliographische Detailangaben
Hauptverfasser:	YAMADA TAKAMASA, OIE MASAYUKI, KAMIYA SHIGEMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a resist compsn. having well-balanced resist characteristics and being suitable to be used for lithography using short wavelength light such as far ultraviolet rays, KrF rays, excimer laser light, by incorporating a hydrogenated product of a specified alkali-soluble phenol resin and a photosensitive compd. into the compsn. CONSTITUTION:The title resist compsn. contains a hydrogenated product of an alkali-soluble phenol resin and a photosensitive compound. Said hydrogenated product of an alkali-soluble phenol resin is obtd. by hydrogenating a condensation produce of a phenolic compd. with an aldehydic compd., condensation product of a phenolic compd. with a ketonic compd., or an isopropenyl phenol type polymer. Suitable phenolic compd. to be used is phenol, cresol, pyrogallol, etc. Thus, a resist material having well-balanced characteristics such as sensitivity, resolution, etching resistance, preservation stability, etc., is obtd.