JPH0235449B

PURPOSE:To obtain a thin film pattern of organic resin with a single process, by irradiating a substrate surface with far ultraviolet rays in the form of the specified pattern and also irradiating an organic resin material with far ultraviolet rays. CONSTITUTION:A far ultraviolet ray pattern 5 is fo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAKASU YASUHIRO, TODOKORO YOSHIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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