PHOTOGRAPHIC RECORDING MATERIAL
PURPOSE: To obtain good retouching property and high scratching resistance by incorporating a dispersion of fine SiO2 particles having a specified average particle size and a sharp distribution of particle size and a polymer containing reactive groups into a protective layer and/or a back coating la...
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| creator | HANSUUTEO BUTSUSHIYUMAN PUREMU RARUBANI BORUFUGANGU HIMERUMAN GIYUNTAA RERINGU |
| description | PURPOSE: To obtain good retouching property and high scratching resistance by incorporating a dispersion of fine SiO2 particles having a specified average particle size and a sharp distribution of particle size and a polymer containing reactive groups into a protective layer and/or a back coating layer. CONSTITUTION: This recordign material consists of a supporting body, at least one silver halide emulsion layer and a protective layer on the side for from at least one silver halide emulsion layer, and at need, a back coating layer. The protective layer and/or the back coating layer contains a combination of a polymer compd. having at least 0.2mol% of the repeating unit expressed by the formula and crystalline SiO2 . The SiO2 particles are finely dispersed and have 0.7-1.2μm average particle size, and contains particles having >4μm particle size by |
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CONSTITUTION: This recordign material consists of a supporting body, at least one silver halide emulsion layer and a protective layer on the side for from at least one silver halide emulsion layer, and at need, a back coating layer. The protective layer and/or the back coating layer contains a combination of a polymer compd. having at least 0.2mol% of the repeating unit expressed by the formula and crystalline SiO2 . The SiO2 particles are finely dispersed and have 0.7-1.2μm average particle size, and contains particles having >4μm particle size by <0.2vol% and particles having <0.5μm particle size by <5vol%. In the formula, R to R are each hydrogen, a alkyl group or a halogen, L is a chemical bond or standard connecting chain, and X is a reactive group. 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Thereby, good mechanical property, especially scratching resistance in a wet state, fracture resistance in the parallel direction and scratching resistance in a dry state can be obtd.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS |
| title | PHOTOGRAPHIC RECORDING MATERIAL |
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