PHOTOGRAPHIC RECORDING MATERIAL

PURPOSE: To obtain good retouching property and high scratching resistance by incorporating a dispersion of fine SiO2 particles having a specified average particle size and a sharp distribution of particle size and a polymer containing reactive groups into a protective layer and/or a back coating la...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HANSUUTEO BUTSUSHIYUMAN, PUREMU RARUBANI, BORUFUGANGU HIMERUMAN, GIYUNTAA RERINGU
Format:	Patent
Sprache:	eng
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE: To obtain good retouching property and high scratching resistance by incorporating a dispersion of fine SiO2 particles having a specified average particle size and a sharp distribution of particle size and a polymer containing reactive groups into a protective layer and/or a back coating layer. CONSTITUTION: This recordign material consists of a supporting body, at least one silver halide emulsion layer and a protective layer on the side for from at least one silver halide emulsion layer, and at need, a back coating layer. The protective layer and/or the back coating layer contains a combination of a polymer compd. having at least 0.2mol% of the repeating unit expressed by the formula and crystalline SiO2 . The SiO2 particles are finely dispersed and have 0.7-1.2μm average particle size, and contains particles having >4μm particle size by