PHOTOSENSITIVE COMPOSITE, PHOTORESIST COMPOSED OF THE SAME AND MANUFACTURING METHOD OF PRINTING PLATE

PURPOSE: To ensure satisfactory exposure and process characteristics and high photosensitivity by incorporating a mixture of specified hexaarylbisimidazole or its isomer having structural isomerism with at least one kind of specified halogen compd. and a color coupler. CONSTITUTION: This photosensit...

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Bibliographische Detailangaben
Hauptverfasser:	FURIIDORIHI ZAITSU, GEERUHARUTO BAUAA, GEERUHARUTO HOFUMAN, YURUGEN FUNGAA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: To ensure satisfactory exposure and process characteristics and high photosensitivity by incorporating a mixture of specified hexaarylbisimidazole or its isomer having structural isomerism with at least one kind of specified halogen compd. and a color coupler. CONSTITUTION: This photosensitive compsn. contains a mixture of hexaarylbisimidazole represented by formula I or its isomer having structural isomerism with at least one kind of halogen compd. represented by formula II and at least one kind of color coupler capable of forming a dye by oxidation. In the formula I, Ar is optionally substd. phenyl and Ar is phenyl, halogen at 2- or 2'-position, etc. In the formula II, R is optionally substd. alkyl, etc., X is SO or NO, (n) is 1 or 2 and each of R and R is H, etc. The compsn. is excellent in exposure characteristics and even a fine image element can surely be reproduced in a state faithful to the original.