THIN FILM FOR PELLICLE

PURPOSE:To obtain an excellent light transmittance and durability even in a far IR region and to obtain characteristics to prevent the generation of static electricity by forming the thin film of a specific perfluorinated ion exchange polymer. CONSTITUTION:The thin film for a cover (pellicle) used t...

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Bibliographische Detailangaben
Hauptverfasser:	FUKUMOTO MITSUNOBU, KANEKO YASUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain an excellent light transmittance and durability even in a far IR region and to obtain characteristics to prevent the generation of static electricity by forming the thin film of a specific perfluorinated ion exchange polymer. CONSTITUTION:The thin film for a cover (pellicle) used to protect a photomask from sticking of dust in an exposing stage at the time of the formation of integrated circuits consists of the perfluorinated ion exchange polymer having a -SO3M functional group (M is H, Na, K or NR4; R is H, CH2 or C2H5). The thin film for the pellicle which has the excellent durability and light transmissivity over a 200 to 500nm wavelength range and does not generate the static electricity is obtd. in this way.