MACHINING METHOD OF SUPERCONDUCTIVE THIN-FILM

PURPOSE:To machine an oxide superconductive thin-film, the characteristics of an oxide superconductor of which are not deteriorated, by forming a metallic layer having low reactivity onto the surface of the oxide superconductive thin- film and then a resist film onto the metallic layer. CONSTITUTION...

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Bibliographische Detailangaben
Hauptverfasser: TANAKA SABURO, NAKANISHI SHUSUKE, ITOZAKI HIDEO, HIGAKI KENJIRO, YATSU SHUJI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To machine an oxide superconductive thin-film, the characteristics of an oxide superconductor of which are not deteriorated, by forming a metallic layer having low reactivity onto the surface of the oxide superconductive thin- film and then a resist film onto the metallic layer. CONSTITUTION:A metallic layer having low reactivity with an oxide superconductor constituting an oxide superconductive thin-film is formed onto the surface of the thin-film using a photolithographic technique, and a resist film onto the metallic layer. Consequently, since the oxide superconductive thin-film is not brought into contact directly with a resist, a developer, etc., and also receives no ion bombardment, characteristics thereof are not deteriorated. A metal having low resistivity with the oxide superconductor such as Ag, Al, In, etc., can be used as a metallic layer material. Accordingly, the oxide superconductive thin-film can be machined to various superconducting devices without lowering the superconductive characteristics of the thin-film.