THIN FILM TYPE NONLINEAR ELEMENT

THIN FILM TYPE NONLINEAR ELEMENT

PURPOSE:To prevent the deterioration of the characteristics of an element with the lapse of time, to improve the nonlinearity and to reduce the capacity by using a metal nitride-contg. metal oxide film as an insulating material and forming a metal nitride-contg. metal oxide film as an underlayer. CO...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: ONO NAGAMASA
Format: Patent
Sprache:eng
Schlagworte:
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:PURPOSE:To prevent the deterioration of the characteristics of an element with the lapse of time, to improve the nonlinearity and to reduce the capacity by using a metal nitride-contg. metal oxide film as an insulating material and forming a metal nitride-contg. metal oxide film as an underlayer. CONSTITUTION:A metal 1 such as Al, Ti, Nb or Ta or an alloy contg. such metals 1 is sputtered on a substrate 6 in an nitrogen-contg. atmosphere and a metal film formed on the substrate 6 is thermally oxidized to form a metal nitride-contg. metal oxide film 5 as an underlayer. A metal 3 such as Al, Ti, Nb or Ta or an alloy contg. such metals 3 is then sputtered on the underlayer 5 in a nitrogen-contg. atmosphere and a metal film formed on the underlayer 5 is thermally or anodically oxidized to form an insulating film 2. An MIM thin film type nonlinear element obtd. by forming the underlayer 5 and the insulating film 2 has satisfactory nonlinearity, small capacity and extremely stabilized characteristics.