DRY ETCHING APPARATUS

PURPOSE:To enhance anisotropy, Si selection ratio and mass productivity by heating an anode plate out of a vacuum tank. CONSTITUTION:An etching chamber is evacuated, and etching gas 8 is simultaneously introduced into the etching chamber trough a diffusing plate 5, an O-ring 9 and an anode 1 to be h...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KAKEHI YUTAKA, UEYAMA KEIJI, OMOTO YUTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To enhance anisotropy, Si selection ratio and mass productivity by heating an anode plate out of a vacuum tank. CONSTITUTION:An etching chamber is evacuated, and etching gas 8 is simultaneously introduced into the etching chamber trough a diffusing plate 5, an O-ring 9 and an anode 1 to be held under a predetermined pressure. A magnetic field generated by a magnet 11 and an electric field generated from a high frequency power source connected to a cathode 2 are formed in the etching chamber, and a discharge is generated. The anode 1 is heated by a ring heater 10. The anode 1 is made of a material having satisfactory thermal conductivity. Since a quartz ring 6 and the anode 1, an upper plate 7 are isolated via a vacuum layer therebetween, the part of the anode 1 in the etching chamber is maintained at a uniform temperature. If the material of the anode 1 is made of a material having low thermal conductivity, a heat medium passage is provided in the anode 1, and silicone oil is fed as the medium.