POSITIVE AND NEGATIVELY TREATED RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN

PURPOSE: To execute a high sensitivity alkali development capable of positive processing and negative processing by using a polymer or a polycondensation product of a reaction product of a phenol hydroxyl group-containing polymer with a dihydropyrane or the like or the other reaction products as a p...

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Bibliographische Detailangaben
Hauptverfasser:	RAINHORUTO SHIYUBUARUMU, HORUSUTO BINDAA
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PURPOSE: To execute a high sensitivity alkali development capable of positive processing and negative processing by using a polymer or a polycondensation product of a reaction product of a phenol hydroxyl group-containing polymer with a dihydropyrane or the like or the other reaction products as a polymer binder. CONSTITUTION: As the polymer hinder, the polymer or the polycondensation product obtained by polymerizing or polycondensating the reaction product of the phenol hydroxyl group-containing polymer with dihydropyrane or an alkyl vinyl ether or the reaction product of the phenol hydroxyl group-containing monomer compound with dihydropyrane or the alkyl vinyl ether is used. As a result, a high activity radiation sensitive composition for forming a relief pattern, which is developed by the alkali aq. solution and is capable of positive processing and negative processing, is obtained.