NOVEL RADIATION-SENSITIVE COMPOUND,AND RADIATION-SENSITIVE MIXTURE AND COPYING MATERIAL PREPARED THEREFROM

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Hauptverfasser:	HERUBERUTO JIIGERU, KURAUSU BERUKUMAN, GERUHARUTO BUURU, HERUMUUTO RENTSU, JIIKUFURIITO SHIERAA
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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