PLASMA ASHING DEVICE

PURPOSE:To achieve plasma ashing of a vacuum exhaust pipe uniformly at fast rate at a room at the side where a substrate is provided by dividing the inside of the vacuum treating room into two rooms, providing a porous shower plate so that a reaction gas introduction pipe may be provided at another room. CONSTITUTION:The inside of a vacuum treating room 2 is divided into two rooms 12 and 13 by providing a shower plate 11 consisting of a porous plate made of aluminum along the surface with a gap 10 in reference to the surface of the substrate 1 where a photo resist film 9 is applied. Then, a vacuum exhaust pipe 8 is connected to the room 12 where this substrate 1 exists and a reaction gas introduction pipe 6 is connected to another room 13. Reaction gas introduced into the vacuum treating room hits against the entire surface of the resist film 9 through a large number of holes in shower and the resist film 9 is decomposed and vaporized due to contact with radical of reaction gas at each part. Thus, elimination can be made uniformly at an ashing rate.