MANUFACTURING EQUIPMENT OF SEMICONDUCTOR DEVICE

PURPOSE:To stabilize the oxidation for removing a photoresist stably by a method wherein nitrite smoke using oxygen as a carrier gas is stably fed to sulfuric acid. CONSTITUTION:Sulfuric acid 2 contained in a resist removing vessel 1 is heated by a heater 3 with the temperature of the sulfuric acid 2 being monitored by a thermostat 4. Oxygen is fed to a nitrite smoke producer 17 containing nitric acid 18 through the intermediary of a pressure regulator 12, an electromagnetic valve 13, a flow rate controller 14 and a gas filter 15. Then, the nitrite smoke using oxygen gas as a carrier gas is led into the vessel 1 through a carrier gas leading-in pipe 21. The carrier gas led into the vessel 1 jets to the wafers 10 side from the pore at the end of the pipe 21. Through these procedures, when the wafers 10 with photoresist sticked thereon are contained in a basket 11 to be immersed in the vessel 1, the photoresist with hydrocarbon thereof decomposed by the sulfuric acid 2 can be removed stably by the oxidation of the nitrite smoke.