FORMATION OF THIN FILM HAVING EXCELLENT ADHESION

PURPOSE:To obtain the title thin film having excellent adhesion and which is not stripped off even when violently mechanically vibrated by irradiating the surface of a material to be treated with an N ion beam from an N ion source at specified irradiation quantity and accelerating voltage, and then applying vacuum deposition. CONSTITUTION:A material 15 to be treated set on a holder 16 in an evacuated 3 vacuum vessel 2 is irradiated with the N ion beam from an ion source 4 under the conditions shown by the formulas. The surface is prepared for the adhesion of a thin film by sputtering and nitrification. The vapor deposition material is vapor-deposited and supplied from the vapor deposition source on the treated surface by an electron beam to form a thin film. In this case, a shutter 11 is freely opened and closed by the electric signal from the outside of the vessel 2, and the vapor deposition is carried out on occasion. The composition of the material to be treated and the vapor-deposited metal are fused together through the nitrided compds. of both metal and material by this method, and hence the adhesion is remarkably improved.