RESIST COMPOSITION

PURPOSE:To improve the balance among sensitivity, resolution, etching resistance and preservable stability by incorporating an alkaline soluble compd. obtd. from a phenolic compd. contg. a specific compd. and an aldehyde compd. CONSTITUTION:This compsn. contains the alkaline soluble compd. obtd. fro...

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Bibliographische Detailangaben
Hauptverfasser:	OIE MASAYUKI, KAMIYA SHIGEMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE:To improve the balance among sensitivity, resolution, etching resistance and preservable stability by incorporating an alkaline soluble compd. obtd. from a phenolic compd. contg. a specific compd. and an aldehyde compd. CONSTITUTION:This compsn. contains the alkaline soluble compd. obtd. from the phenolic compd. contg. at least 5wt.% compd. expressed by the formula I and the aldehyde compd. In the formula, R denotes an alkenyl group or alkenyloxy group; R denotes hydrogen, alkyl group, alkoxy group or halogen. The sensitivity is insufficient and the residual film rate falls drastically if the content of the compd. expressed by the formula I is below 5wt.%. The resist compsn. which is excellent in the balance among the sensitivity, resolution, etching resistance and preservable stability is obtd. in this way.