FORMATION OF RADIATION SENSITIVE MIXTURE AND RELIEF PATTERN FOR PHOTOSENSITIVE COATING MATERIAL

PURPOSE: To improve activity by forming a polymer binder insoluble in water, soluble in aq. alkaline solution and containing a specific compound from a copolymer having o-nitrobenzyl group. CONSTITUTION: The polymer binder insoluble in water and soluble in the alkaline aq. solution is the copolymer...

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1. Verfasser:	RAINHORUTO SHIYUBUARUMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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