POSITIVE TYPE PHOTORESIST

PURPOSE: To improve the resolution of a resist and to make the slope of an edge remarkably sharp by incorporating a specific photosensitive compound and a compound for accelerating developing rate. CONSTITUTION: An alkali soluble resin (a), 1,2-naphthoquinone-diazide-5-sulfonyl ester (b) of trihydro...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HORUSUTO MUYUNTSUERU, RAINHARUTO SHIYURUTSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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