POSITIVE TYPE PHOTORESIST

POSITIVE TYPE PHOTORESIST

PURPOSE: To improve the resolution of a resist and to make the slope of an edge remarkably sharp by incorporating a specific photosensitive compound and a compound for accelerating developing rate. CONSTITUTION: An alkali soluble resin (a), 1,2-naphthoquinone-diazide-5-sulfonyl ester (b) of trihydro...

Ausführliche Beschreibung

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Hauptverfasser: HORUSUTO MUYUNTSUERU, RAINHARUTO SHIYURUTSU
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:PURPOSE: To improve the resolution of a resist and to make the slope of an edge remarkably sharp by incorporating a specific photosensitive compound and a compound for accelerating developing rate. CONSTITUTION: An alkali soluble resin (a), 1,2-naphthoquinone-diazide-5-sulfonyl ester (b) of trihydroxybenzene isomer and an aromatic hydroxy compound (c) are blended. The component (b) is blended so as to be at least 0.5μm in absorption coefficient to light fading absorption and the component (c) is blended so as to be 15-30wt.% of total solid. As the component (b), 1,2-naphthoquinone- diazide-5-sulfonyl trisester of 1,3,5-trihydroxy benzene is preferably used, as the component (c), 2,3,4,-trihydroxybenzophenone or the like is preferably used, and as the component (a), the novolak resin or the like can be used.