ELECTRON BEAM CORRECTION IN ELECTRON BEAM EXPOSING DEVICE

PURPOSE:To prevent the misalignment of the edges of the first and the second slit apertures and an exposure coordinate system from occurring by a method wherein electron beams in the second irradiation width are scanned on fine Ta masses automatically selected. CONSTITUTION:Electronic beams 8a in the first irradiation width W1 are scanned by deflecting systems 10a-10b on multiple fine masses provided on an Si substrate through the intermediary of a slit size controller 19 to detect reflected electrons 8b through the intermediary of a detector 4 and an amplifier 6c. The rotary angle theta of a slit processed through the intermediary of a beam edge detecting means 16, an edge rotary angle measuring means 17 and an edge rotary angle correcting means 18 conforming to the waveform data on the electron 8b. Next, the first and the second slit apertures 9a, 9b are adjusted by a rotation adjuster according to the processed data to align the edges of the apertures 9a, 9b with an exposure coordinate system. Through these procedures, the misalignment of the edges of the apertures 9a, 9b with the exposure coordinate system can be prevented from occurring.