INLIKE-TYPE SPUTTERING DEVICE FOR MAGNETO-OPTICAL DISK

PURPOSE:To form a magneto-optical disk film free from diffusion and contamination by providing isolation chambers having discharge ports and gas-introducing ports, respectively, and hermetically sealed by means of gate valves, respectively, to plural film-forming spaces at the time of manufacturing a magneto-optical disk by means of an inline sputtering device. CONSTITUTION:At the time of manufacturing a magneto-optical disk by means of an inline sputtering device by alternately forming dielectric layers (i) composed of oxide and nitride and a medium layer (h) composed of rare earth metal alloy on a substrate (e), the magneto-optical disk is manufactured on an inline system by passing a carrier 2 on which an optical disk substrate 1 is placed through a stocking chamber 3, film-forming chambers 6, 7, 8, and a takeout chamber 9. In this device, isolation chambers 15, 16 equipped with discharge ports 13 and ports 14 for introducing Ar gas for sputtering, respectively, and hermetically sealed with gate valves, respectively, are provided between respective film-forming chambers 6, 7, 8, by which the magneto- optical disk which has the dielectric layers (i) and the medium layer (h) free from mutural contamination due to sputtering gas between respective film-forming chambers and diffusion between respective layers and having superior qualities can be obtained.