FORMATION OF THIN FILM

PURPOSE:To easily form a patterned thin film on a substrate by providing a patterned beam passing hole in a target at the time of forming the thin film of the target material on the substrate by ion-beam sputtering. CONSTITUTION:In the ion-beam sputtering device, an inert gas such as Ar, N2 is intro...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YASUJIMA HIROYUKI, NISHITANI MIKA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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