METHOD FOR PURIFYING NITROGEN TRIFLUORIDE GAS

PURPOSE:To efficiently, safely and economically remove dinitrogen difluoride which is an impurity contained in nitrogen trifluoride gas, by heating the nitrogen triloride gas in a vessel having the inner wall coated with nickel fluoride at a specific temperature. CONSTITUTION:Nitrogen trifluoride co...

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Hauptverfasser: HOKONOHARA HISASHI, YAMAGUCHI TOSHIAKI, HARADA ISAO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To efficiently, safely and economically remove dinitrogen difluoride which is an impurity contained in nitrogen trifluoride gas, by heating the nitrogen triloride gas in a vessel having the inner wall coated with nickel fluoride at a specific temperature. CONSTITUTION:Nitrogen trifluoride containing dinitrogen difluoride as at least an impurity is heated at 150-600 deg.C temperature in a vessel having the inner wall coated with nickel fluoride. The above-mentioned vessel can be readily obtained by passing F2 gas through a vessel, such as made of nickel or iron, having the nickel plated inner surface in a state heated at about 30-200 deg.C for about 10min-10hr.